SCANNING November 1996 Vol.18, 8 - "High Resolution Lithography with Near-Field Optical Microscopy"

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Near-field optical lithography of a Picasso drawing. X and Y = 12µm

A. Naber, H. Kock, H. Fuchs -- Physikalishes Institut, Münster, Germany

Scanning near-field optical microscopy (NSOM) is used for lithography to avoid the resolution limiting diffraction of conventional optical methods. We have expanded a commercial NSOM for writing even complex structures on the nanometer scale. Scanning near-field optical lithography (SNOL) has been applied to conventional resists to explore its potential and the possible combination with conventional optical lithography (mix and match technique).

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Aurora - NSOM- Optical Microscope
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